Give us a reference, please. I've never heard of it, and I did a brief web search and found nothing relevant.I have treated all three of my guns with Microlon Gun Juice, and can offer an endorsement of it, based on dirt build-up. I noticed it on my Ruger 22/45 MK III. My usual shooting session is 200 rounds, and before using Microlon, the whole pistol would get crudded up with greasy powder residue which was hard to remove.

Since the treatment, there is only a thin film of dry powder, which comes off quite easily. Matt Burkett is a professional shooter with a podcast. Ion Bond is one of his sponsors.

Original owner m45a1 in the new IonBond finish (much more durable vs the old Cerakote) Everything down to the hang tag and plastic bags included. Early 13k serial range with one DLC black and one standard stainless Wilson mags (they shipped that way for a short time) Standard features include. Does anyone have a BCG finished in 'Ionbond', and if so, what do you. Of BCM's regular standard milspec BCG's in my 16' midlength rifle,.

On his show lat week, he told of the competition gun he had coated by Ion Bond. When he got it back, he ran his knife down the slide and it left a line of metal from the knife on the slide that he was able to rub off. He also related a story of someone who tried a destruction test on the coating by dragging a coated slide behind his truck down a a road for several miles with no damage to the coating. He finally shot it with a.45, which destroyed the slide but didn't remove the coating. Matt says he's done with hard chrome, bluing, parkerizing, or any other coating.

His only warning was to choose colors carefully, because he's not sure if it can be removed.The only reference I've seen on the web is a company that coats drill bits, gears, etc.The Firearms Forum is on online community for all gun enthusiasts. Join us to discuss firearms of all kinds, gun accessories, legal issues and more.

Membership is free and we welcome all types of shooters, whether you're a novice or a pro. Come for the info, stay and make some friends. Site Functions. Useful Links. Support the site!We work hard to bring the best Firearms Forum has to offer!

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Ion plating (IP) is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles. Bombardment prior to deposition is used to sputter clean the substrate surface. During deposition the bombardment is used to modify and control the properties of the depositing film. It is important that the bombardment be continuous between the cleaning and the deposition portions of the process to maintain an atomically clean interface.

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Process[edit]

In ion plating the energy, flux and mass of the bombarding species along with the ratio of bombarding particles to depositing particles are important processing variables. The depositing material may be vaporized either by evaporation, sputtering (bias sputtering), arc vaporization or by decomposition of a chemical vapor precursor chemical vapor deposition (CVD). The energetic particles used for bombardment are usually ions of an inert or reactive gas, or, in some cases, ions of the condensing film material ('film ions'). Ion plating can be done in a plasma environment where ions for bombardment are extracted from the plasma or it may be done in a vacuum environment where ions for bombardment are formed in a separate ion gun. The latter ion plating configuration is often called Ion Beam Assisted Deposition (IBAD). By using a reactive gas or vapor in the plasma, films of compound materials can be deposited.

Ion plating is used to deposit hard coatings of compound materials on tools, adherent metal coatings, optical coatings with high densities, and conformal coatings on complex surfaces.

Advantages[edit]

• Better surface coverage than other methods (Physical vapor deposition, Sputter deposition).^[1]
• More energy available on the surface of the bombarding species, resulting in more complete bonding.^[1]
• Flexibilty with the level of ion bombardment.^[1]
• Improved chemical reactions when supplying plasma and energy to surface of the bombarding species.^[1]

Disadvantages[edit]

• Increased variables to take into account when compared to other techniques.^[1]
• Uniformity of plating not always consistent^[1]
• Excessive heating to the substrate^[1]
• Compressive stress^[1]

History[edit]

The ion plating process was first described in the technical literature by Donald M. Mattox of Sandia National Laboratories in 1964.^[2]

Further reading[edit]

• Anders, André, ed. (3 October 2000). Handbook of Plasma Immersion Ion Implantation and Deposition (1st ed.). Wiley-VCH. doi:10.1016/S0257-8972(97)00037-6. ISBN978-0471246985. LCCN99089627. OCLC634942008. OL7614013M.
• Bach, Hans; Krause, Dieter, eds. (10 July 2003). Thin Films on Glass (Schott Series on Glass and Glass Ceramics). Schott Series on Glass and Glass Ceramics. Springer Science+Business Media. doi:10.1007/978-3-662-03475-0. ISBN978-3540585978. LCCN97029134. OCLC751529805. OL682447M. Retrieved 10 October 2019.
• Bunshah, Rointan F. (15 January 1995). Handbook of deposition technologies for films and coatings : science, technology and applications. Materials science and process technology series (2nd ed.). William Andrew. ISBN978-0815513377. LCCN93030751. OCLC849876613. OL1420629M.
• Gläser, Hans Joachim (2000). Large Area Glass Coating (1st ed.). Von Ardenne Anlagentechnik. ISBN978-3000049538. OCLC50316451.
• Glocker, David A; Shah, I Ismat, eds. (1 October 1995). Handbook of Thin Film Process Technology (Looseleaf ed.). IOP Publishing. doi:10.1201/9781351072786. ISBN978-0750303118. OCLC834296544. OL9554916M.
• Mahan, John E. (1 February 2000). Physical Vapor Deposition of Thin Films (1st ed.). Wiley-VCH. ISBN978-0471330011. OCLC924737051. OL22626840M.
• Mattox, Donald M. (19 May 2010). Handbook of Physical Vapor Deposition (PVD) Processing (2nd ed.). William Andrew. doi:10.1016/C2009-0-18800-1. ISBN978-0815520375. OCLC613958939. OL25555274M.
• Mattox, Donald M. (2018). The Foundations of Vacuum Coating Technology (2nd ed.). William Andrew. doi:10.1016/C2016-0-03988-8. ISBN978-0-12-813084-1. OCLC249553816. OL8048877M – via Elsevier.
• Mattox, Donald M.; Mattox, Vivivenne Harwood, eds. (6 September 2018). 50 Years of Vacuum Coating Technology and the Growth of the Society of Vacuum Coaters. Society of Vacuum Coaters (2nd ed.). William Andrew. ISBN978-0128130841. LCCN2003004260. OCLC1104455795.
• Westwood, William D. (2003). Sputter deposition. AVS Education Committee book series. 2. Education Committee, AVS. ISBN978-0735401051. OCLC52382234. OL10597406M.
• Willey, Ronald R. (15 December 2007). Practical Monitoring and Control of Optical Thin Films. Willey Optical Consultants (2nd ed.). Willey Optical, Consultants. ISBN978-0615181448. OCLC500718626.
• Willey, Ronald R. (27 October 2007). Practical Equipment, Materials, and Processes for Optical Thin Films. Willey Optical, Consultants. ISBN978-0615143972. OCLC954134936. OL26817514M.

See also[edit]

References[edit]

1. ^ ^abcdefghLampert, Dr. Carl (3 January 2013). 'Vacuum Deposition and Coating Options'. pfonline.com. Gardner Business Media. Archived from the original on 16 July 2017. Retrieved 10 October 2019. Ion plating uses energetic ion bombardment during deposition to densify the deposit and control properties of the coating such as stress and microstructure.
2. ^Mattox, Donald M. (1 September 1964). Sandia National Laboratories. 'Film Deposition Using Accelerated Ions'. Electrochemical Technology. 2. OCLC571781676. OSTI4672659.

External links[edit]

• 'Society of Vacuum Coaters'. Retrieved 2 October 2019.